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NiCrAlSi Sputtering Target High Purity Tipis Film Pvd Coating Custom Made

Nikel Kromium Aluminium Silicon

Katrangan singkat:

Babagan

Paduan Sputtering Target

Formula Kimia

NiCrAlSi

Komposisi

Nikel Kromium Aluminium Silicon

Kemurnian

99,5%, 99,9%, 99,95%

wangun

Piring, Target Kolom, katoda busur, Digawe khusus

Proses Produksi

Leleh vakum

Ukuran kasedhiya

L≤1500mm, W≤200mm


Detail Produk

Tag produk

Target Sputtering NiCrAlSi diprodhuksi dening Vacuum Melting, Casting lan Perawatan Panas kanggo njamin konsistensi sing dhuwur, ukuran gandum sing apik lan kinerja sing apik.

Amarga resistivity dhuwur sing apik banget, prilaku anti-karat sing apik, tahan suhu dhuwur lan solderability, alloy Nikel Chromium Aluminium Silicon akeh digunakake ing akeh aplikasi industri, kalebu Metalurgi, Manufaktur Mekanikal, lan Perkakas Rumah Tangga.

Rich Special Materials spesialisasi ing Pabrik Sputtering Target lan bisa gawé Nickel Chromium Aluminium Silicon Sputtering Materials miturut specifications Pelanggan.Kanggo informasi luwih lengkap, hubungi kita.


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