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Nikel Tantalum

NiTa Sputtering Target High Purity Thin Film Pvd Coating Custom Made Featured Image

Katrangan singkat:

Babagan	Paduan Sputtering Target
Formula Kimia	NiTa
Komposisi	Tantalum nikel
Kemurnian	99,9%, 99,95%, 99,99%
wangun	Piring, Target Kolom, katoda busur, Digawe khusus
Proses Produksi	Leleh vakum, PM
Ukuran kasedhiya	L≤200mm, W≤200mm

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Detail Produk

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Target Sputtering Nikel Tantalum diprodhuksi kanthi cara peleburan vakum utawa proses metalurgi bubuk.Wis kemurnian dhuwur lan microstructure homogen.

Nikel Tantalum Sputtering Target digunakake akeh ing aerospace, pesawat, industri navigasi.Resistance apik kanggo reaktivitas lumahing suhu dhuwur asalé saka jumlah owahan saka Tantalum saiki ing alloy, kang wis suhu leleh dhuwur saka 3000 ° C.Aluminium, Yttrium lan Chronium biasane ditambahake kanggo nambah sifat.

Bahan Khusus Sugih spesialisasi ing Pabrik Target Sputtering lan bisa ngasilake Bahan Sputtering Nikel Tantalum miturut spesifikasi Pelanggan.Kanggo informasi luwih lengkap, hubungi kita.

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