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Tungsten Nickel Iron

WNiFe Sputtering Target High Purity Thin Film Pvd Coating Custom Made Featured Image

Katrangan singkat:

Babagan	Paduan Sputtering Target
Formula Kimia	WNiFe
Komposisi	Tungsten Nickel Iron
Kemurnian	99,9%, 99,95%, 99,99%
wangun	Piring, Target Kolom, katoda busur, Digawe khusus
Proses Produksi	PM
Ukuran kasedhiya	L≤200mm, W≤200mm

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Tungsten Nickel Iron alloy sputtering target digawe kanthi metalurgi bubuk.Nduwe akeh sifat sing béda, kayata kapadhetan dhuwur, daktilitas, lan kekuatan sing relatif ora bisa ditandingi karo paduan logam liyane.Biasane rasio wesi nikel yaiku 7:3 utawa 1:1.

Tungsten Nickel Iron alloy fitur Kapadhetan dhuwur, kekuatan, plasticity, machinability, konduktivitas termal lan listrik banget, lan kapasitas kanggo nresep sinar-x lan γ sinar.Tungsten Nikel wesi wesi digunakake sacara ekstensif ing shielding, counterweight, balancing, dampening geter, aplikasi perkakas suhu.

Bahan Khusus Sugih spesialisasi ing Pabrik Target Sputtering lan bisa ngasilake Bahan Sputtering Besi Nikel Tungsten miturut spesifikasi Pelanggan.Kanggo informasi luwih lengkap, hubungi kita.