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Kobalt Chromium Tantalum

CoCrTa Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made Featured Image

Katrangan singkat:

Babagan	Paduan Sputtering Target
Formula Kimia	CoCrTa
Komposisi	Kobalt Chromium Tantalum
Kemurnian	99,9%, 99,95%, 99,99%
wangun	Piring, Target Kolom, katoda busur, Digawe khusus
Proses Produksi	Leleh vakum
Ukuran kasedhiya	L≤200mm, W≤200mm

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Target sputtering kobalt Chromium Tantalum diprodhuksi dening proses casting lan leleh vakum.lan banjur dibentuk dadi wangun target sing dikarepake.Wis kemurnian dhuwur lan microstructure homogen.Co-Cr-Ta biyen dadi bahan kritis kanggo rekaman magnetik amarga sifat magnetik: coercivity dhuwur, sifat gangguan kurang lan squareness banget.

Bahan Khusus Sugih spesialisasi ing Pabrik Target Sputtering lan bisa ngasilake Bahan Sputtering Kobalt Chromium Tantalum miturut spesifikasi Pelanggan.Kanggo informasi luwih lengkap, hubungi kita.

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