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Wesi Aluminium Alloy Target

FeAl Sputtering Target High Purity Thin Film Pvd Coating Custom Made Featured Image

Katrangan singkat:

Babagan	Paduan Sputtering Target
Formula Kimia	FeAl
Komposisi	Wesi Aluminium alloy target
Kemurnian	99,9%, 99,95%, 99,99%
wangun	Piring, Target Kolom, katoda busur, Digawe khusus
Proses Produksi	Leleh vakum
Ukuran kasedhiya	L≤2000mm, W≤200mm

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Biasane, wesi Aluminium alloy sputtering target wis 6% -16% isi Aluminium.Iki nuduhake sifat magnetik sing apik banget lan asring digunakake ing deposisi film mikromotor.
Wesi Aluminium wesi sing conventionally kasedhiya ing ngudani karo kekandelan saka 0.1-0.5mm.Padha duwe resistivity dhuwur, atose, geter lan resistance impact, digabungake karo Kapadhetan kurang (6.5 ~ 7.2g/m3).Intine wesi sing digawe saka lembaran Aluminium wesi nduweni mundhut arus eddy sing kurang lan bobot entheng.

Wesi Aluminium Alloys dipérang dadi: 1J6.1J12.1J16, nomer konco J isi Aluminium.Kanthi nambah isi Aluminium, konduktivitas magnetik lan resistivitas bahan bakal saya apik, dene induksi magnetik jenuh - mudhun.
Bahan Khusus Sugih spesialisasi ing Pabrik Target Sputtering lan bisa ngasilake Bahan Sputtering Aluminium Besi miturut spesifikasi Pelanggan.Kanggo informasi luwih lengkap, hubungi kita.

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